Cookies ussage consent
Our site saves small pieces of text information (cookies) on your device in order to deliver better content and for statistical purposes. You can disable the usage of cookies by changing the settings of your browser. By browsing our site without changing the browser settings you grant us permission to store that information on your device.I agree, do not show this message again.
R. REBIGAN1, M. KUSKO1,* , G. SOROHAN2, D. URSU2, M. GEORGESCU2, O. TUTUNARU1, R. TUDOR1, R. TOMESCU1, D. CRISTEA1, C. KUSKO1,*
- National Institute for R&D in Microtechnologies – IMT Bucharest, 126 A Erou Iancu Nicolae, Bucharest Romania
- ProOptica S.A Bucharest Romania
We investigated the antireflective properties of nanostructured silicon layers fabricated by metal – assisted wet silicon etching. The morphological characterizations reveal that the nanostructured surface consists of holes with diameters in the range of several tens of nanometers, presenting filling factors of 0.50 and with depths in the range of 1 – 1.3 µm. The structures configuring the silicon surface have features much smaller than that of the wavelength of the radiation in the mid – infrared spectrum domain such that the layer can be regarded as homogeneous. The FTIR spectroscopy determinations show that this layer is antireflective over a broad range of infrared wavelengths realizing efficient AR coatings for infrared optical components made on silicon..
Antireflecting layers, Nanostructured silicon, Infrared optics, Metal assisted chemical etching.
Submitted at: Sept. 4, 2019
Accepted at: April 9, 2020
R. REBIGAN, M. KUSKO, G. SOROHAN, D. URSU, M. GEORGESCU, O. TUTUNARU, R. TUDOR, R. TOMESCU, D. CRISTEA, C. KUSKO, Nanostructured silicon based antireflective layers for thermal infrared optical components, Journal of Optoelectronics and Advanced Materials Vol. 22, Iss. 3-4, pp. 136-142 (2020)
- Download Fulltext
- Downloads: 1 (from 1 distinct Internet Addresses ).