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Optical and chemical properties of vanadium oxide thin films prepared by vacuum arc discharge

O. MRAD1,* , I. M. ISMAIL1, B. ABDALLAHb2, M. S. RIHAWY1

Affiliation

  1. Atomic Energy Commission, Department of Chemistry, P. O. Box 6091, Damascus, Syria
  2. Atomic Energy Commission, Department of Physics, P. O. Box 6091, Damascus, Syria

Abstract

Vanadium oxide thin films have been prepared using vacuum arc discharge technique. Two sets of samples were prepared by altering two different experimental parameters, one by applying different chamber temperatures at constant gas mixture ratios (O2 / Ar) and the other by using different gas mixture ratios in the chamber at fixed temperature. The optical band gap of the films was evaluated using UV-vis-NIR scanning spectrophotometer, by recording transmittance spectra. X-ray photoelectron spectroscopy (XPS), was devised to obtain the chemical state of vanadium in the surface of the films. Elemental composition and thicknesses of the films have been estimated by means of Rutherford backscattering technique. A correlation between the optical prosperities of the films with the chemical structure was evaluated..

Keywords

Gap energy, Vanadium oxides, Vacuum arc discharge, RBS, XPS.

Submitted at: Nov. 6, 2013
Accepted at: Sept. 11, 2014

Citation

O. MRAD, I. M. ISMAIL, B. ABDALLAHb, M. S. RIHAWY, Optical and chemical properties of vanadium oxide thin films prepared by vacuum arc discharge, Journal of Optoelectronics and Advanced Materials Vol. 16, Iss. 9-10, pp. 1099-1103 (2014)