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Optical and structural analysis of ammonia-free cooper sulphide thin films using chemical deposition method

S. J. CASTILLO1, A. APOLINAR-IRIBE2,* , ANED DE LEÓN3, C. RUVALCABA-CORNEJO4

Affiliation

  1. Departamento de Investigación en Física, Universidad de Sonora, Apdo. Postal 5-088. CP. 83000, Hermosillo, Sonora, México
  2. Departamento de Física, Universidad de Sonora, Apdo. Postal 1626. CP. 83000, Hermosillo, Sonora , México.
  3. Departamento de Investigación en Polímeros y Materiales, Universidad de Sonora, Apdo. Postal 130, CP. 83000, Hermosillo, Sonora, México
  4. Departamento de Matemáticas, Universidad de Sonora, CP. 83000, Hermosillo, Sonora, México

Abstract

We report the synthesis of cooper sulphide thin films ammonia-free by chemical bath method using triethanolamine and barium hydroxide as chelating agents and were deposited on glass microscope slides at 600 C. The use of these complexing agents improving the adhesion of the deposited films and reduces of time reaction. The structural characterization was carried out by X-ray diffraction and atomic force microscopic. The X-ray diffraction analysis showed a amorphous nature of thin film and indirect transition with a bandgap of 1.28 eV and index refraction of the 1.515..

Keywords

CuS, Thin film, Chemical deposition.

Submitted at: Sept. 15, 2011
Accepted at: Oct. 20, 2011

Citation

S. J. CASTILLO, A. APOLINAR-IRIBE, ANED DE LEÓN, C. RUVALCABA-CORNEJO, Optical and structural analysis of ammonia-free cooper sulphide thin films using chemical deposition method, Journal of Optoelectronics and Advanced Materials Vol. 13, Iss. 10, pp. 1258-1261 (2011)