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Optical characterization and thickness estimation of Al3+ ion doped ZnO nano-films from transmittance spectra

D. K. MADHUP1,2,* , D. P. SUBEDI1, S. P. CHIMOURIY1

Affiliation

  1. Thin Film and Plasma Science Laboratory, Kathmandu University, Dhulikhel, Kavre, Nepal.
  2. College of Biomedical Engineering and Applied Sciences, Hadigaun, Kathmandu, Nepal

Abstract

Al3+ ion doped and un-doped ZnO thin films deposited by nebulized spray pyrolysis method have been studied in the present work. The transmittance spectrum from UV-VIS-NIR spectrophotometer in 200 to 1100 nm wavelength range was used to retrieve the optical parameters: Optical band gap, Refractive index, Dielectric constant, Packing density, Dissipation factor, Optical conductivity, Relaxation time, carrier concentration to effective mass ratio, plasma frequency and Thickness for all films. Instead of entire Swanepoel algorithm, we used minimization approach which is appropriate to achieve an absolute optical properties and thickness as well, from the transmittance spectra even if it devoid of enough interference fringes. The analysis of the optical data revealed that the percentage of transmittance decreases gradually and there is widening of optical band gap to certain percentage of Al doping inside the ZnO. However, the other optical parameters showed dominant characteristics only at 3 mol% of Al3+ doping inside the ZnO..

Keywords

ZnO, Spray Pyrolysis, UV-VIS-NIR spectrophotometer, Transmittance.

Submitted at: April 1, 2010
Accepted at: May 26, 2010

Citation

D. K. MADHUP, D. P. SUBEDI, S. P. CHIMOURIY, Optical characterization and thickness estimation of Al3+ ion doped ZnO nano-films from transmittance spectra, Journal of Optoelectronics and Advanced Materials Vol. 12, Iss. 5, pp. 1035-1044 (2010)