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Optical emission and mass spectroscopy of plasma processes in reactive DC pulsed magnetron sputtering of aluminium oxide

M. NOVOTNÝ1,* , J. BULÍŘ1, P. POKORNÝ1, J. BOČAN1, P. FITL1, J. LANČOK1, J. MUSIL1

Affiliation

  1. Institute of Physics, Academy of Sciences of the Czech Republic, Na Slovance 2, 182 21 Prague 8, Czech Republic

Abstract

Optical emission spectroscopy (OES) and mass spectrometry were used for plasma investigation of DC pulsed reactive magnetron sputtering of aluminium oxide. Aluminium target was sputtered in a reactive oxygen/argon atmosphere. Special attention was paid to the transition from the dielectric to metallic mode. Mass spectra were recorded at the substrate. OES spectra were taken at the target and at the substrate. Both mass and emission spectra obtained in the transition mode revealed distinct changes in plasma composition (O, O2, Al and AlO plasma species and corresponding positive ions). The transition from the dielectric to metallic mode is followed by a decrease of atomic oxygen intensity, while the intensity of aluminium species increases. AlO molecule appeared in the mass spectra only..

Keywords

Reactive magnetron sputtering, Alumina, Plasma spectroscopy, Mass spectroscopy, Optical emission spectroscopy.

Submitted at: June 19, 2009
Accepted at: Feb. 27, 2010

Citation

M. NOVOTNÝ, J. BULÍŘ, P. POKORNÝ, J. BOČAN, P. FITL, J. LANČOK, J. MUSIL, Optical emission and mass spectroscopy of plasma processes in reactive DC pulsed magnetron sputtering of aluminium oxide, Journal of Optoelectronics and Advanced Materials Vol. 12, Iss. 3, pp. 697-700 (2010)