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Physical and photocatalytic properties of laser fabricated crystalline TiO2 at low temperatures

J. REMSA1,* , M. JELÍNEK1,2, T. KOCOUREK1,2, J. MIKŠOVSKÝ2, V. STUDNIČKA1, V. VORLÍČEK1, V. SVÁTA3, V. VYMĚTALOVÁ1

Affiliation

  1. Institute of Physics ASCR, Na Slovance 2, 182 21 Prague 8, Czech Republic
  2. Czech Technical University in Prague, Faculty of Biomedical Engineering, nam. Sitná 3105, 272 01 Kladno , Czech Republic
  3. Institute of Physical chemistry ASCR, Dolejškova 2155/3, 182 23 Prague 8, Czech Republic

Abstract

We report on an extensive study of the deposition of titanium dioxide layers by pulsed laser deposition at either room temperature or at 200°C (300°C, 400°C, 500°C) from pure titanium and titanium dioxide targets. Some amorphous samples were annealed by the rapid thermal annealing method. The study is focused on the effect of variation of pressure of the reactive oxygen and the inert argon atmospheres, and the mixtures of both. The laser fluency varied in the range 2 J/cm2 to 9 J/cm2 . The crystalline structure was characterized by X-ray diffraction and Raman Spectroscopy and for the study of the surface properties, atomic force microscopy was used. The TiO2 photocatalytic characteristics were determined using 4- chlorphenol solution degradation evaluated by pH measurement. Polycrystalline (anatase, rutile, and brookite) and amorphous layers exhibiting photocatalytic behavior were obtained at low substrate temperatures (200°C)..

Keywords

Pulsed laser deposition, TiO2, Contact angle, Photocatalytic properties, Thin films.

Submitted at: June 18, 2009
Accepted at: Feb. 27, 2010

Citation

J. REMSA, M. JELÍNEK, T. KOCOUREK, J. MIKŠOVSKÝ, V. STUDNIČKA, V. VORLÍČEK, V. SVÁTA, V. VYMĚTALOVÁ, Physical and photocatalytic properties of laser fabricated crystalline TiO2 at low temperatures, Journal of Optoelectronics and Advanced Materials Vol. 12, Iss. 3, pp. 754-757 (2010)