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Preliminary results on comparative study of three methods for nanocarbon films deposition: thermionic vacuum arc, magnetron sputtering and cathodic arc

R. VLADOIU1,* , V. CIUPINA1, A. MANDES1, V. DINCA1, M. CONTULOV1, G. PRODAN1, G. MUSA1

Affiliation

  1. Department of Physics, Ovidius University, Constanta, 900527, Romania

Abstract

The aim of this paper is to make a comparative analysis of the properties of the nanostructred carbon thin films deposited by three PVD type methods: an original one: Thermionic Vacuum Arc (TVA), Filtered Cathodic Vacuum Arc (FCVA) and Magnetron Sputtering (MS). In the TVA method, the deposition takes part in the vapors of the anode materials, the deposited film containing only the ions of this material and therefore the energy of ions could achieve values up to 500 V. The structures of the films have been characterized by X-ray Photoelectrons Spectroscopy (XPS), Auger electron spectroscopy AES, Raman spectroscopy and Transmission Electron Microscopy (TEM)..

Keywords

Thermionic Vacuum Arc (TVA), Nanostructured carbon thin films, XPS, Raman spectrum, TEM.

Submitted at: Sept. 25, 2007
Accepted at: March 17, 2008

Citation

R. VLADOIU, V. CIUPINA, A. MANDES, V. DINCA, M. CONTULOV, G. PRODAN, G. MUSA, Preliminary results on comparative study of three methods for nanocarbon films deposition: thermionic vacuum arc, magnetron sputtering and cathodic arc, Journal of Optoelectronics and Advanced Materials Vol. 10, Iss. 3, pp. 723-726 (2008)