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Properties changes of Ti(C, O, N) films prepared by PVD: the effect of reactive gases partial pressure

L. CUNHA1,* , C. MOURA1, F. VAZ2, J.-M. CHAPPÉ2, C. OLTEANU3, D. MUNTEANU3, A. MUNTEANU3

Affiliation

  1. Physics Department, University of Minho, Campus de Gualtar, Braga – Portugal
  2. Physics Department, University of Minho, Campus de Azurém, Guimarães - Portugal
  3. Dept. of Technological Equipment and Materials Science, Transilvania University, Brasov - Romania

Abstract

Dark Ti-C-O-N thin films were deposited by dc reactive magnetron sputtering. A titanium target was sputtered while three different gas flows were injected into the deposition chamber: argon (working gas), acetylene and a mixture of oxygen and nitrogen (reactive gases). The films were produced with variation of the gases flow rates, maintaining the remaining parameters constant. Varying the ratio between the reactive gases flow (gas mixture/acetylene) allowed obtaining films with different characteristics. The colour of the films was characterized by spectral reflectance spectroscopy, and expressed in the CIE 1976 L*a*b* colour space. An accurate control of the deposition conditions allowed obtaining intrinsic and stable dark colours for decorative applications. Composition analysis by electron probe microanalysis was done to quantify the elemental concentrations in the films. X-ray diffraction experiments revealed the evolution of the film structure which showed to be essentially amorphous, but with evidences of fcc structure..

Keywords

Reactive sputtering, Titanium oxycarbonitride, Decorative properties.

Submitted at: June 2, 2009
Accepted at: July 23, 2009

Citation

L. CUNHA, C. MOURA, F. VAZ, J.-M. CHAPPÉ, C. OLTEANU, D. MUNTEANU, A. MUNTEANU, Properties changes of Ti(C, O, N) films prepared by PVD: the effect of reactive gases partial pressure, Journal of Optoelectronics and Advanced Materials Vol. 11, Iss. 7, pp. 976-980 (2009)