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M. C. RAO1
Affiliation
- Department of Physics, Andhra Loyola College, Vijayawada – 520008, India.
Abstract
Thin films of LiNixCo1-xO2 were prepared by pulsed laser deposition technique. Two important deposition parameters such as substrate temperature and oxygen partial pressure during the thin film deposition were controlled. The structural properties of the films have been investigated as a function of deposition conditions, which play important role in the physical and chemical characteristics of the material. The films deposited at 700 0 C in an oxygen partial pressure of 100 mTorr exhibited R3m layered structure. FTIR and Raman measurements confirm the XRD data showing the formation of pure phase LiNixCo1-xO2. The growth of LiNixCo1-xO2 films were studied in relation to the deposition parameters for their effective utilization as cathode materials in solid state microbattery application..
Keywords
LiNixCo1-xO2 thin films, PLD, Structure, FTIR, Raman.
Submitted at: Dec. 6, 2010
Accepted at: Jan. 26, 2011
Citation
M. C. RAO, Spectroscopic investigations on laser ablated LiNixCo1-xO2 thin films, Journal of Optoelectronics and Advanced Materials Vol. 13, Iss. 1, pp. 72-75 (2011)
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