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Structural and electrical properties of La0.8Pb0.2FeO3 thin films deposited by rf magnetron sputtering

C. DOROFTEI1,* , F. IACOMI1, P. D. POPA2

Affiliation

  1. “Al. I. Cuza” University, Faculty of Physics, 11 Carol I Blvd, 7000506 Iasi, Romania
  2. Institute of Technical Physics, Bd. D. Mangeron 47, 700050 Iasi, Romania

Abstract

The structural and electric properties of some thin films obtained through rf magnetron sputtering using as target the La0.8Pb0.2FeO3 perovskite have been studied. We have investigated the effects of the quartz and alumina substrate, its temperature during deposition, as well as of sputtering gas composition (Ar/O2 ratio) and subsequent heat treatments. The thin films microstructure was characterized by XRD, SEM, EDX and AFM analyses. The XRD patterns indicate the generation of perovskite phase and the increase of its crystallinity after a heat treatment at 750o C/30min. The micrographs indicate the formation of a uniformly clustered structure of the films after the heat treatment. From the resistivity standpoint, the layers are practically insensitive to environmental humidity up to a value of about 53% RH and presents a good sensitivity to humidity within the range 53% - 98% RH..

Keywords

Perovskites, RF magnetron sputtering, Structural properties, Electrical properties.

Submitted at: Sept. 25, 2012
Accepted at: Feb. 20, 2013

Citation

C. DOROFTEI, F. IACOMI, P. D. POPA, Structural and electrical properties of La0.8Pb0.2FeO3 thin films deposited by rf magnetron sputtering, Journal of Optoelectronics and Advanced Materials Vol. 15, Iss. 1-2, pp. 69-72 (2013)