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M. T. HOSSEINNEJAD1,* , M. ETTEHADI-ABARI1, N. PANAHI2, M. A. FERDOSI ZADEH3, S. W. CASE2
- Young Researchers and Elites Club, Science and Research Branch, Islamic Azad University, Tehran, Iran
- Department of Physics, Bandar Abbas Branch, Islamic Azad University, Bandar Abbas, Iran
- Department of Mechanical Engineering, Faculty of Engineering, Central Tehran Branch, Islamic Azad University, Tehran, Iran
Nano crystalline Titanium Nitride (TiN) thin films were deposited on glass substrates using DC reactive magnetron sputtering. The effect of substrate temperature on the structural, morphological and mechanical properties of TiN thin films has been investigated using different analysis. Obtained results from XRD analysis revealed that crystal structure characteristics of deposited thin films strongly depend on substrate temperature. According to the SEM and AFM results, the size of grains and surface roughness of deposited samples increased with increasing the temperature. Also hardness measurements revealed that the highest mechanical hardness is obtained when the film is deposited at 400oC substrate temperature..
TiN thin film, DC magnetron sputtering, Nanostructures, XRD, AFM.
Submitted at: Sept. 9, 2016
Accepted at: June 7, 2017
M. T. HOSSEINNEJAD, M. ETTEHADI-ABARI, N. PANAHI, M. A. FERDOSI ZADEH, S. W. CASE, Structural, morphological and mechanical hardness properties of titanium nitride thin films deposited by DC magnetron sputtering: Effect of substrate temperature, Journal of Optoelectronics and Advanced Materials Vol. 19, Iss. 5-6, pp. 434-439 (2017)
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