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Study of key processes in the fabrication of high quality diffraction gratings by nanoimprint lithography

QIANG ZUO1, LEI WANG1, YIWEN ZHANG1, ZHIHAO WANG1, NING ZHOU2, DINGLI WANG2, ZHIMOU XU1, YANLI ZHAO1, WEN LIU1,2,*

Affiliation

  1. Wuhan National Laboratory for Optoelectronics, School of Optoelectronic Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China
  2. Accelink Technologies Co. Wuhan 430074, China

Abstract

Diffraction grating is very critical component of distributed feedback laser diode (DFB LD) and its quality has a strong influence on the performance of final device. Nanoimprint lithography (NIL), as a very promising technology for nanostructure fabrication, has been applied to fabricate diffraction grating recently. In this paper, key processes to achieve high quality gratings by NIL are discussed, including the soft stamp applying, the removal of residual layer and the etching of substrate. Large area and high quality diffraction gratings are demonstrated at the end, laying the foundation for industrial-level mass production of DFB LD diffraction gratings by NIL..

Keywords

Diffraction gratings, Nanoimprint lithography (NIL), Soft stamp, Residual layer, Etching.

Submitted at: March 17, 2011
Accepted at: April 11, 2011

Citation

QIANG ZUO, LEI WANG, YIWEN ZHANG, ZHIHAO WANG, NING ZHOU, DINGLI WANG, ZHIMOU XU, YANLI ZHAO, WEN LIU, Study of key processes in the fabrication of high quality diffraction gratings by nanoimprint lithography, Journal of Optoelectronics and Advanced Materials Vol. 13, Iss. 4, pp. 331-337 (2011)