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Study of the third-order nonlinear optical properties of nano-crystalline porous silicon using a simplified Bruggeman formalism

T. BAZARU1,* , V. I. VLAD1, A. PETRIS1, P. S. GHEORGHE1

Affiliation

  1. National Institute for Lasers, Plasma and Radiation Physics, Dept. of Lasers, R-077125 Bucharest - Magurele, Romania

Abstract

In this paper, we simplify and apply optical modelling of Bruggeman-type nano-composites, for calculation of the effective optical linear and nonlinear properties of nano-structured silicon, in particular of nano-porous silicon. We used laser excitation with photon energy close to the estimated band-gap energy of nano-porous silicon, looking for important optical nonlinearities at low intensity levels. This regime is non-perturbative for the nano-structured sample and we observe pure optoelectronic effects in np-Si. The effective refractive index and effective third-order nonlinear susceptibility, calculated with our simplified formulae, and the corresponding measured parameters in our experiments are in good agreement..

Keywords

Bruggeman model, Nano-porous silicon, Intensity scan, Reflection Z-Scan.

Submitted at: June 19, 2009
Accepted at: June 28, 2009

Citation

T. BAZARU, V. I. VLAD, A. PETRIS, P. S. GHEORGHE, Study of the third-order nonlinear optical properties of nano-crystalline porous silicon using a simplified Bruggeman formalism, Journal of Optoelectronics and Advanced Materials Vol. 11, Iss. 6, pp. 820-825 (2009)