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The kinetics of ordered domains in monolayer deposition

I. ACHIK1, A. HADER1, Y. BOUGHALEB1,2,* , A. HAJJAJI3,4,* , M. BAKASSE2

Affiliation

  1. Laboratoire de Physique de la Matière Condensée. Université Hassan II-Mohammedia, Faculté des sciences, Ben M’sik Casablanca-Morocco
  2. Université Chouaib Doukkali, Faculté des sciences, El Jadida-Morocco
  3. Universite de Lyon, INSA-Lyon, LGEF Laboratoire de Genie Electrique et Ferroelectricite´, Bat. Gustave Ferrie, 8 rue de la physique, F-69621 Villeurbanne cedex, France
  4. Université Chouaib Doukkali, Ecole Nationale des Sciences Appliquées d’El Jadida, EL Jadida, Morocco

Abstract

In this work, we study the growth of ordered domains observed during deposition of a monolayer. We use mean field lattice gas model to describe the kinetics. Our results on the calculated dynamical structure factor provide insights on how the growth of ordered domains depends on the adatom/adatom interaction and the role played by the competition between the deposition and the diffusion processes. Using the dynamic scaling, we show that the growth of these ordered domains is characterized by the growth and the roughness exponents values: 2  2.64  0.05 ; 2 2.36 0.04 , satisfying the KardarParisi-Zhang relation for d>1..

Keywords

Lattice gas model, Submonolayer deposition, Growth process, Surface diffusion, Ordered domains; Monolayer deposition.

Submitted at: March 15, 2011
Accepted at: March 16, 2011

Citation

I. ACHIK, A. HADER, Y. BOUGHALEB, A. HAJJAJI, M. BAKASSE, The kinetics of ordered domains in monolayer deposition, Journal of Optoelectronics and Advanced Materials Vol. 13, Iss. 3, pp. 319-323 (2011)