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The size effects of inclusions on laser induced film damage

JINGHUA HAN1, YAGUO LI2, WEIXING FAN1, CHANGTAO HE3, PINGQIU WANG4, RUIHUA NIU4, GUOYING FENG1,* , QUANXI LIU4

Affiliation

  1. School of Electronics and Information Engineering, Sichuan University, Chengdu, 610064, China
  2. Fine Optical Engineering Research Center, Chengdu 610041, China
  3. XinJiang Astronomical Observatory, Chinese Academy of Sciences, Urumqi 830011 , China
  4. Southwest Institute of Technical Physics, Chengdu 610041,China

Abstract

The damage of thin films due to inclusions can be caused by thermal accumulation, interference of scattered light with the incident laser beam and laser induced plasma. The synergic effects of these three mechanisms determine the damage characteristics of optical thin films, each of which is related to the size of inclusions in thin films. Our research results show that the films are damaged owing to the localized interference of light and the melting of thin films when the radii of inclusion particles lie within 24 nm and 40 nm. The laser-induced plasma resulting from the evaporation and ionization of thin film material will be generated when the radii of inclusion particles are larger than 40 nm. Those smaller than 24 nm, can be regarded as safe and free from inducing damage..

Keywords

Laser-induced damage, Inclusion, Thermal effect, Scattering, Laser plasma.

Submitted at: Aug. 8, 2012
Accepted at: Sept. 18, 2013

Citation

JINGHUA HAN, YAGUO LI, WEIXING FAN, CHANGTAO HE, PINGQIU WANG, RUIHUA NIU, GUOYING FENG, QUANXI LIU, The size effects of inclusions on laser induced film damage, Journal of Optoelectronics and Advanced Materials Vol. 15, Iss. 9-10, pp. 943-947 (2013)