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Thermionic vacuum Arc deposited Cu and Co nanostructured multilayers: synthesis and characterization

D. RĂSLEANU1, D. ILIE1, V. IONESCU1, V. MOCANU1, M. G. MUREŞAN1, I. M. OANCEA – STĂNESCU1,* , V. CIUPINĂ1, G. PRODAN1, E. VASILE2, I. MUSTAŢĂ3, V. ZAROSCHI3, C. P. LUNGU3

Affiliation

  1. Department of Physics, Ovidius University, Constanta, 900527, Romania
  2. Metav-CD S.A., Bucharest, 050025, Romania
  3. National Institute for Laser, Plasma and Radiation Physics, Magurele, 077125, Romania

Abstract

The paper presents an approach for obtaining and the characterization of several nanostructured materials with special resistive magnetic properties. The Cu and Co thin films are grown by the physical Thermionic Vacuum Arc method (TVA). Successive layers of Cu and Co were deposited on glass, silicon and ceramic substrates using tungsten crucibles containing Cu and Co metals, respectively. The morphological and structural investigations were achieved by means of electron microscopy techniques: TEM (Philips, CM120ST) and SEM. The compositional analysis of the films together with the atomic percentage determination of the constituent elements were performed by the Energy Dispersive X-ray Spectroscopy (EDS) analysis..

Keywords

Multilayers, Thermionic vacuum arc, Cu, Co.

Submitted at: April 7, 2010
Accepted at: April 26, 2010

Citation

D. RĂSLEANU, D. ILIE, V. IONESCU, V. MOCANU, M. G. MUREŞAN, I. M. OANCEA – STĂNESCU, V. CIUPINĂ, G. PRODAN, E. VASILE, I. MUSTAŢĂ, V. ZAROSCHI, C. P. LUNGU, Thermionic vacuum Arc deposited Cu and Co nanostructured multilayers: synthesis and characterization, Journal of Optoelectronics and Advanced Materials Vol. 12, Iss. 4, pp. 834-838 (2010)