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O.-C. CIOBOTEA-BARBU1,2, I.-A. CIOBOTARU1, D.-I. VAIREANU1,* , D. G. DUMITRAS2, C. NICOLAE2
- University POLITEHNICA of Bucharest, Faculty of Applied Chemistry and Materials Science, 1-7 Polizu Street, 011061, Bucharest, Romania
- Geological Institute of Romania, 1 Caransebes Street, 01227, Bucharest, Romania
This paper presents the characterization of a Ni-Cu thin layer electrodeposited onto a steel substrate. The characterization of these films was performed with X-ray diffraction spectroscopy, Raman spectroscopy and Scanning electron microscopy. The results of the XRD analysis showed a Face Centered Cubic structure and the Raman spectroscopy indicated the presence of Cu2O, CuO and NiO into the films..
Electrodeposited Ni-Cu films, surface analysis, XRD, Raman, SEM.
Submitted at: Oct. 18, 2018
Accepted at: Aug. 20, 2019
O.-C. CIOBOTEA-BARBU, I.-A. CIOBOTARU, D.-I. VAIREANU, D. G. DUMITRAS, C. NICOLAE, XRD, Raman and SEM surface analysis on Ni-Cu electrodeposited layers, Journal of Optoelectronics and Advanced Materials Vol. 21, Iss. 7-8, pp. 536-540 (2019)
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